• CVD a i ʻole PVD Processing
CVD a i ʻole PVD Processing

ʻEkolu mau ʻanuʻu i ke kaʻina hana o ka hoʻoheheʻe ʻana i ka mahu kino (PVD): Ka hoʻokuʻu ʻana o nā ʻāpana mai nā mea maka; Lawe ʻia nā ʻāpana i ka substrate; Hoʻopili nā ʻāpana, nucleate, ulu a kiʻiʻoniʻoni ma ka substrate.

E like me ka inoa i hōʻike ʻia, hoʻohana ka hoʻoheheʻe ʻana i ka mahu kemika (CVD), e hoʻohana i nā mea hoʻoheheʻe mua e hana i nā kiʻiʻoniʻoni paʻa ma o nā hopena kemika a me ka molekala. Pono e haʻi ʻia e hoʻohana nui ʻia ka chemical vapor deposition (CVD) i ka epitaxy kristal semiconductor kiʻekiʻe a me ka hoʻomākaukau ʻana i nā kiʻiʻoniʻoni insulating like ʻole. No ka laʻana, ma MOS FET, ʻo nā kiʻiʻoniʻoni i waiho ʻia e CVD me polycrystalline Si, SiO2, hewa, etc.


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E ʻoluʻolu e leka a e hoʻi mākou iā ʻoe!