Muaj peb theem nyob rau hauv cov txheej txheem ntawm lub cev vapor deposition (PVD): Emission ntawm hais los ntawm raw cov ntaub ntawv; Cov khoom raug thauj mus rau lub substrate; Cov khoom sib xyaw ua ke, nucleate, loj hlob thiab zaj duab xis ntawm substrate.

Chemical vapor deposition (CVD), raws li lub npe implies, siv gaseous precursor reactants los tsim cov yeeb yaj kiab los ntawm cov tshuaj atomic thiab molecular tshuaj. Nws yog tsim nyog hais tias tshuaj vapor deposition (CVD) yog dav siv nyob rau hauv high-zoo semiconductor crystal epitaxy thiab kev npaj ntawm ntau yam insulating films. Piv txwv li, hauv MOS FET, cov yeeb yaj kiab tso los ntawm CVD suav nrog polycrystalline Si, SiO2, kev txhaum, thiab lwm yam.