Enwere usoro atọ n'ime usoro ntinye ego nke anụ ahụ (PVD): mpụta nke ụmụ irighiri ihe sitere na akụrụngwa; The ahụ na-ebuga na mkpụrụ;The ahụ condense, nukleate, eto na film na mkpụrụ.

Kemịkalụ vapor deposition (CVD), dị ka aha ahụ pụtara, na-eji gaseous precursor reactants na-emepụta ihe nkiri siri ike site na mmeghachi omume kemịkalụ na molekụla. Ọ dị mma ịkọwa na a na-eji kemịkalụ vapor deposition (CVD) eme ihe n'ọtụtụ ebe na semiconductor crystal epitaxy dị elu na nkwadebe nke ihe nkiri mkpuchi dị iche iche. Dịka ọmụmaatụ, na MOS FET, ihe nkiri CVD debere gụnyere polycrystalline Si, SiO2, sin, wdg.