Pane zvinhanho zvitatu mukuita kwekuiswa kwemhute yemuviri (PVD): Kuburitswa kwezvidimbu kubva kune zvakabikwa; Zvimedu zvinotakurwa kuenda kune substrate; Izvo zvimedu zvinodzika, nucleate, kukura uye firimu pane substrate.

Chemical vapor deposition (CVD), sekureva kwazvinoreva, inoshandisa gaseous precursor reactants kugadzira mafirimu akasimba kuburikidza neatomu uye mamorekuru kemikari. Zvakakosha kutaura kuti kemikari vapor deposition (CVD) inoshandiswa zvakanyanya mumhando yepamusoro semiconductor crystal epitaxy uye kugadzirira kwemafirimu akasiyana-siyana anodzivirira. Semuenzaniso, muMOS FET, mafirimu akaiswa neCVD anosanganisira polycrystalline Si, SiO2, chivi, nezvimwe.