Ho na le mekhahlelo e meraro ts'ebetsong ea ho beha mouoane oa 'mele (PVD): Ho ntšoa ha likaroloana tse tsoang thepa e tala; Likaroloana li isoa substrate; Likaroloana lia hola, lia hola, 'me li etsa filimi holim'a substrate.

Chemical vapor deposition (CVD), joalo ka ha lebitso le bolela, e sebelisa li-gaseous precursor reactants ho etsa lifilimi tse tiileng ka karabelo ea lik'hemik'hale tsa athomo le limolek'hule. Ke habohlokoa ho bolela hore lik'hemik'hale tsa mouoane oa lik'hemik'hale (CVD) li sebelisoa haholo ho epitaxy ea boleng bo phahameng ba semiconductor crystal epitaxy le ho lokisetsa lifilimi tse fapa-fapaneng tsa insulating. Mohlala, ho MOS FET, lifilimi tse behiloeng ke CVD li kenyelletsa polycrystalline Si, SiO2, sin, joalo-joalo.